Method of forming a capacitor

ABSTRACT

A carbon containing masking layer is patterned to include a plurality of container openings therein having minimum feature dimensions of less than or equal to 0.20 micron. The container openings respectively have at least three peripheral corner areas which are each rounded. The container forming layer is plasma etched through the masking layer openings. In one implementation, such plasma etching uses conditions effective to both a) etch the masking layer to modify shape of the masking layer openings by at least reducing degree of roundness of the at least three corners in the masking layer, and b) form container openings in the container forming layer of the modified shapes. Capacitors comprising container shapes are formed using the container openings in the container forming layer. Other implementations and aspects are disclosed.

TECHNICAL FIELD

[0001] This invention relates to methods of forming capacitors.

BACKGROUND OF THE INVENTION

[0002] As DRAMs increase in memory cell density, there is a continuing challenge to maintain sufficiently high storage capacitance despite decreasing cell area. Additionally, there is a continuing goal to further decrease cell area. One principal way of increasing cell capacitance is through cell structure techniques. Such techniques include three-dimensional cell capacitors, such as trenched or stacked capacitors.

[0003] One type of capacitor structure forms at least one of the capacitor electrodes into a container-like shape. A suitable opening is formed within a container forming material, typically a dielectric layer although bulk and other substrate materials can be used. A conductive layer is formed within the openings to partially fill them to form upwardly open vessel-like structures. The conductive material is then patterned or planarized back, typically to form isolated capacitor electrodes for the capacitors being formed. Some or all of the container forming layer might then be etched from the substrate to expose outer sidewalls of the container-shaped electrodes. One or more suitable capacitor dielectric layers would then be formed over the container-shaped electrode. Another conductive layer is then formed over the capacitor dielectric layer(s) and patterned or otherwise processed to complete the capacitor construction.

[0004] As minimum feature dimensions get smaller and smaller, the thickness or vertical length/height of devices tends to increase, and does so particularly with capacitors in order to maintain adequate surface area and accordingly desired capacitance.

SUMMARY

[0005] The invention includes methods of forming capacitors. In one implementation, a method of forming a capacitor includes depositing a container forming layer over a substrate. A carbon containing masking layer is deposited over the container forming layer. The carbon containing masking layer is patterned to comprise a plurality of container openings therein having minimum feature dimensions of less than or equal to 0.20 micron. The container openings respectively have at least three peripheral corner areas which are each rounded. The container forming layer is plasma etched through the masking layer openings. In one implementation, such plasma etching uses conditions effective to both a) etch the masking layer to modify shape of the masking layer openings by at least reducing degree of roundness of the at least three corners in the masking layer, and b) form container openings in the container forming layer of the modified shapes. In one implementation, the respective container openings in the masking layer include a plurality of straight line segments at least 2 nanometers long. The container forming layer is plasma etched through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings to increase the number of straight line segments at least 2 nanometers long, and b) form container openings in the container forming layer of the modified shapes. In one implementation, the carbon containing masking layer is patterned to comprise a plurality of circular shaped container openings therein having minimum diameter of less than or equal to 0.20 micron. The container forming layer is plasma etched through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings from circular to having at least four straight line segments of at least 2 nanometers long, and b) form container openings in the container forming layer of the modified shapes. Capacitors comprising the container shapes are formed using the container openings in the container forming layer.

[0006] Other aspects and implementations are contemplated.

BRIEF DESCRIPTION OF THE DRAWINGS

[0007] Preferred embodiments of the invention are described below with reference to the following accompanying drawings.

[0008]FIG. 1 is a diagrammatic sectional view of an exemplary substrate fragment at a processing step in accordance with an aspect of the invention.

[0009]FIG. 2 is a view of the FIG. 1 substrate at a processing step subsequent to that shown by FIG. 1.

[0010]FIG. 3 is an expanded top plan view of the FIG. 2 substrate.

[0011]FIG. 4 is a view of the FIG. 2 substrate at a processing step subsequent to that shown by FIG. 2.

[0012]FIG. 5 is an enlarged top plan view of the FIG. 4 substrate.

[0013]FIGS. 6 and 7, respectively, are top plan views of an alternate substrate corresponding in processing sequence to that depicted by FIGS. 3 and 5, respectively, in accordance with an aspect of the invention.

[0014]FIGS. 8 and 9, respectively, are top plan views of another alternate substrate corresponding in processing sequence to that depicted by FIGS. 3 and 5, respectively, in accordance with an aspect of the invention.

[0015]FIGS. 10 and 11, respectively, are top plan views of still another alternate substrate corresponding in processing sequence to that depicted by FIGS. 3 and 5, respectively, in accordance with an aspect of the invention.

[0016]FIGS. 12 and 13, respectively, are top plan views of yet another alternate substrate corresponding in processing sequence to that depicted by FIGS. 3 and 5, respectively, in accordance with an aspect of the invention.

[0017]FIGS. 14 and 15, respectively, are top plan views of still yet another alternate substrate corresponding in processing sequence to that depicted by FIGS. 3 and 5, respectively, in accordance with an aspect of the invention.

[0018]FIGS. 16 and 17, respectively, are top plan view scanning electron micrographs of a reduction-to-practice example corresponding in processing sequence to that depicted by FIGS. 3 and 5, respectively, in accordance with an aspect of the invention.

[0019]FIG. 18 is a view of the FIG. 4 wafer fragment at a processing step subsequent to that shown by FIG. 4.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0020] This disclosure of the invention is submitted in furtherance of the constitutional purposes of the U.S. Patent Laws “to promote the progress of science and useful arts” (Article 1, Section 8).

[0021] Preferred embodiment methods of forming capacitors are described with reference to FIGS. 1-18. Referring initially to FIG. 1, a semiconductor substrate is indicated generally with reference numeral 10. In the context of this document, the term “semiconductor substrate” or “semiconductive substrate” is defined to mean any construction comprising semiconductive material, including, but not limited to, bulk semiconductive materials such as a semiconductive wafer (either alone or in assemblies comprising other materials thereon), and semiconductive material layers (either alone or in assemblies comprising other materials). The term “substrate” refers to any supporting structure, including, but not limited to, the semiconductive substrates described above. Also in the context of this document, the term “layer” encompasses both the singular and the plural unless otherwise indicated.

[0022] Substrate 10 comprises an exemplary bulk substrate material 12, for example monocrystalline silicon. Of course, other materials and substrates are contemplated, including semiconductor-on-insulator and other substrates whether existing or yet-to-be developed. A container forming layer 14 is formed over substrate 12. An exemplary preferred material is an insulative material, such as borophosphosilicate glass (BPSG). An exemplary deposition thickness range is from 10,000 Angstroms to 30,000 Angstroms. A carbon containing masking layer 16 is deposited over container forming layer 14. Exemplary preferred materials include amorphous carbon and photoresists, for example 248 nm and 193 nm photoresists. Of course, multilayer or other masking layer processings are also contemplated, such as multilayer resist processing. An exemplary thickness for layer 16 is from 1,000 Angstroms to 10,000 Angstroms.

[0023] Referring to FIGS. 2 and 3, carbon containing masking layer 16 has been patterned to comprise a plurality of container openings 18 having minimum feature dimensions “A” of less than or equal to 0.20 micron, more preferably less than or equal to 0.15 micron, and even more preferably less than or equal to 0.10 micron. Any form of patterning is contemplated, whether existing or yet-to-be-developed, with photolithography and solvent etch being but one preferred example. All of the container openings are depicted as having the same general size and shape, although differing sizes and shapes are also of course contemplated. In the FIGS. 2 and 3 illustrated preferred embodiment, container openings 18 have a generally race track shape. Further additionally and alternately considered, container openings 18 can be considered as having peripheral corner areas 20 which are each perceptibly rounded. In one aspect of the invention, the container openings can be considered as having at least three peripheral corner areas which are rounded, with four being shown in the exemplary FIG. 3 embodiment. In yet a further and alternate consideration, container openings 18 can be considered as having a plurality of straight line segments 22 which are each at least two nanometers long, with only two such segments being shown in the exemplary FIG. 3 embodiment.

[0024] Referring to FIGS. 4 and 5, container forming layer 14 is etched through masking layer openings 18 effective to both modify the shape of the masking layer openings to a shape 18′ and form container openers 25 in container forming layer 14 of the modified shapes. In one considered implementation, conditions are used which are effective to modify the shape of the masking layer openings by at least reducing the degree of roundness of the at least three corners in the masking layer, for example producing corner regions 20 a. In accordance with one preferred implementation, for example as depicted in the FIGS. 3 and 5 embodiment, the etching conditions are effective to reduce the degree of roundness effective to perceptibly square the corner regions when viewed at a magnification level having a field of view in which all of a single container opening is viewable, and in one implementation, to modify the generally race track shaped container openings into rectangles.

[0025] Further in one considered alternate or additional implementation, the etching of the container forming layer through the masking layer openings is conducted using conditions effective to modify the masking layer openings to increase the number of straight line segments which are each at least two nanometers long. For example, FIG. 5 depicts four straight line segments 22 a/26122 a/26 for the respective container openings in the carbon containing masking layer and the container forming layer. Further in one considered implementation, FIG. 5 depicts the etching modifying the shape of the masking layer openings to include at least four straight line segments of at least two nanometers long, with the at least four straight line segments having a total added length which is more than 50% of the perimeter of the respective modified shapes. In such further preferred implementations, the total added length of such segments is more than 60% in one embodiment, more than 70% in one embodiment, more than 80% in one embodiment, and more than 90% in one embodiment of the perimeter of the respective modified shapes. In one reduction to practice example, the lengths of individual segments 22 a and 26 were as 0.3 micron and 0.15 micron respectively, providing a perimeter of about 0.9 micron.

[0026] The inventions were reduced-to-practice in a capacitively coupled, dual-frequency plasma etcher. However, the invention is anticipated to be practicable in other plasma etchers, whether capacitively coupled or having one or multiple frequencies. Further and regardless, by way of example only, the preferred conditions when plasma etching utilize a total applied power to the plasma generating electrodes of at least 7 W/cm² of substrate area being processed, and more preferably at least 10 W/cm² of substrate area being processed. Further by way of example only, the preferred plasma etching uses a chuck and substrate temperature of at least 40° C. An exemplary preferred etching chemistry includes fluorocarbons, such as one or both of C₄F₆ and C₄F₈.

[0027] One preferred set of exemplary plasma etching conditions utilizes multiple frequencies which are applied to the wafer chuck within the chamber upon which the substrate rests during etching. An existing exemplary such reactor is the LAM Research 2300 Excelan Oxide Etching Tool. By way of example only, alternate preferred conditions include etching whereby one frequency is applied to a wafer chuck upon which the substrate rests during etching, and yet another frequency is applied to an electrode which is spaced from the substrate. An exemplary existing such etcher is the Applied Materials Producer Etch Tool.

[0028] Aspects of the invention are expected to have applicability to other than race track shapes, or in producing other than four-sided openings therefrom. By way of example only, some alternate exemplary embodiments are shown with reference to FIGS. 6-15. For example, FIG. 6 depicts a wafer fragment 100 having regular, three-sided container shapes 118 having rounded corner regions. The roundness thereof is appreciably/perceptibly reduced (FIG. 7) by the etching in producing container openings 118 a in the masking layer and container openings 125 in the container opening forming layer. In a similar manner with respect to exemplary regular, six-sided structures, FIGS. 8 and 9 illustrate container openings 218 in the carbon containing masking layer being transformed to openings 218 a and container openings 225 in the capacitor forming layer. Non-regular shapes are also of course contemplated. FIGS. 10 and 11 depict slanted container openings 318 in the carbon containing masking layer being transformed to openings 318 a and container openings 325 in the capacitor forming layer.

[0029] Further by way of example only, the invention contemplates patterning the carbon containing masking layer to comprise a plurality of circular shaped container openings therein having minimum diameter of less than or equal to 0.20 micron. The container forming layer is plasma etched through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings from circular to having at least four straight line segments of at least 2 nanometers long, and b) form container openings in the container forming layer of the modified shapes. For example, FIGS. 12 and 13 depict an array of circular container openings 418 in the carbon containing masking layer being transformed to four-sided/square openings 418 a and container openings 325 in the capacitor forming layer. Further by way of example only, FIGS. 14 and 15 depict an array of circular container openings 518 in the carbon containing masking layer being transformed to hexagonal openings 518 a and container openings 525 in the capacitor forming layer.

[0030] Other implementations are also of course contemplated, with the invention only being limited by the accompanying claims. Further by way of example only, the various exemplary and other shaped container openings might be mixed such that all are not uniform across the substrate, and might be fabricated with container openings, or other openings on the substrate, not falling within the context of the above-described invention.

[0031] Exemplary reduction-to-practice examples are shown by scanning electron micrograph in FIGS. 16 and 17 provided herein. Such processing was conducted in a LAM Research 2300 Excelan Oxide Etch Tool on 200 mm substrates having a container forming layer of BPSG 20,000 Angstroms thick, and a CVD amorphous carbon layer formed thereover which was 3,000 Angstroms thick. The minimum feature dimension across the illustrated container openings in FIG. 16 were 0.11 micron. The etching conditions utilized in the LAM 2300 etching chamber to produce the FIG. 11 construction included 50 mTorr, top plate temperature of 190° C., chuck/bottom electrode temperature 60° C., backside helium pressure 12 Torr, power at both 1200 W at 27 MHz and 1800 W at 2 MHz to the bottom electrode, 270 sccm Ar, 24 sccm of mixed He and O₂ (33% by volume O₂) 7 sccm C₄F₆ and 5 sccm C₄F₈.

[0032] Referring to FIG. 18, exemplary capacitors 40 are shown as having been fabricated which comprise container shapes using container openings 25 formed in container forming layer 14. By way of example only, such are shown as being comprised of respective storage nodes 42, capacitor dielectric layer 44 and a common outer electrode layer 46. Of course, alternate shapes and configuration capacitors are contemplated, and capacitor forming layer 14 might remain completely on the substrate as shown, or be partially or completely removed therefrom. In one preferred implementation, the capacitor is fabricated as part of DRAM circuitry, for example as shown in FIG. 18. Alternately of course, the method has applicability in the fabrication of capacitors used in any kind of circuitry.

[0033] In compliance with the statute, the invention has been described in language more or less specific as to structural and methodical features. It is to be understood, however, that the invention is not limited to the specific features shown and described, since the means herein disclosed comprise preferred forms of putting the invention into effect. The invention is, therefore, claimed in any of its forms or modifications within the proper scope of the appended claims appropriately interpreted in accordance with the doctrine of equivalents. 

1. A method of forming a capacitor, comprising: depositing a container forming layer over a substrate; depositing a carbon containing masking layer over the container forming layer; patterning the carbon containing masking layer to comprise a plurality of container openings therein having minimum feature dimensions of less than or equal to 0.20 micron, the container openings respectively having at least three peripheral corner areas which are each rounded; plasma etching the container forming layer through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings by at least reducing degree of roundness of the at least three corners in the masking layer, and b) form container openings in the container forming layer of the modified shapes; and forming capacitors comprising container shapes using the container openings in the container forming layer.
 2. The method of claim 1 wherein the etching is effective to reducing the degree of roundness effective to square said corner regions when viewed at a magnification level having a field of view in which all of a single container opening is viewable.
 3. The method of claim 1 wherein the container openings have at least four peripheral corner regions, and all of which have reduced degree of roundness from the etching.
 4. The method of claim 1 wherein the container openings have only four peripheral corner regions, and all of which have reduced degree of roundness from the etching.
 5. The method of claim 1 wherein the container openings have only three peripheral corner regions, and all of which have reduced degree of roundness from the etching.
 6. The method of claim 1 wherein the container openings have at least six peripheral corner regions, and all of which have reduced degree of roundness from the etching.
 7. The method of claim 1 wherein the masking layer comprises photoresist.
 8. The method of claim 1 wherein the masking layer comprises amorphous carbon.
 9. The method of claim 1 wherein the patterning comprises photolithography and solvent etch.
 10. The method of claim 1 wherein the container openings are patterned to have minimum feature dimensions of less than 0.15 micron.
 11. The method of claim 1 wherein the container openings are patterned to have minimum feature dimensions of less than 0.10 micron.
 12. The method of claim 1 comprising fabricating the capacitor as part of DRAM circuitry.
 13. The method of claim 1 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed.
 14. The method of claim 1 wherein the conditions comprise plasma etching using a total applied power of at least 10 W/cm² of substrate area being processed.
 15. The method of claim 1 wherein the conditions comprise plasma etching using a substrate temperature of at least 40° C.
 16. The method of claim 1 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, and using a substrate temperature of at least 40° C.
 17. The method of claim 1 wherein the conditions comprise a fluorocarbon comprising etching chemistry.
 18. The method of claim 1 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, using a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 19. The method of claim 1 wherein the conditions comprise plasma etching in a capacitively coupled, multi frequency plasma etcher.
 20. The method of claim 19 wherein multiple frequencies are applied to a wafer chuck upon which the substrate rests during etching.
 21. The method of claim 20 wherein the plasma etching uses a total applied power of at least 7 W/cm² of substrate area being processed to the wafer chuck, uses a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 22. The method of claim 19 wherein one frequency is applied to a wafer chuck upon which the substrate rests during etching and another frequency is applied to an electrode spaced from the substrate.
 23. A method of forming a capacitor, comprising: depositing a container forming layer over a substrate; depositing a carbon containing masking layer over the container forming layer; patterning the carbon containing masking layer to comprise a plurality of generally racetrack shaped container openings therein having minimum feature dimensions of less than or equal to 0.20 micron; plasma etching the container forming layer through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings into rectangles, and b) form container openings in the container forming layer of the modified rectangular shapes; and forming capacitors comprising container shapes using the container openings in the container forming layer.
 24. The method of claim 23 wherein the masking layer comprises photoresist.
 25. The method of claim 23 wherein the masking layer comprises amorphous carbon.
 26. The method of claim 23 wherein the container openings are patterned to have minimum feature dimensions of less than 0.15 micron.
 27. The method of claim 23 wherein the container openings are patterned to have minimum feature dimensions of less than 0.10 micron.
 28. The method of claim 23 comprising fabricating the capacitor as part of DRAM circuitry.
 29. The method of claim 23 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed.
 30. The method of claim 23 wherein the conditions comprise plasma etching using a total applied power of at least 10 W/cm² of substrate area being processed.
 31. The method of claim 23 wherein the conditions comprise plasma etching using a substrate temperature of at least 40° C.
 32. The method of claim 23 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, and using a substrate temperature of at least 40° C.
 33. The method of claim 23 wherein the conditions comprise a fluorocarbon comprising etching chemistry.
 34. The method of claim 23 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, using a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 35. The method of claim 23 wherein the conditions comprise plasma etching in a capacitively coupled, multi frequency plasma etcher.
 36. The method of claim 35 wherein multiple frequencies are applied to a wafer chuck upon which the substrate rests during etching.
 37. The method of claim 36 wherein the plasma etching uses a total applied power of at least 7 W/cm² of substrate area being processed to the wafer chuck, uses a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 38. The method of claim 35 wherein one frequency is applied to a wafer chuck upon which the substrate rests during etching and another frequency is applied to an electrode spaced from the substrate.
 39. A method of forming a capacitor, comprising: depositing a container forming layer over a substrate; depositing a carbon containing masking layer over the container forming layer; patterning the carbon containing masking layer to comprise a plurality of container openings therein having minimum feature dimensions of less than or equal to 0.20 micron, the respective container openings including a plurality of straight line segments of at least 2 nanometers long; plasma etching the container forming layer through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings to increase the number of straight line segments of at least 2 nanometers long, and b) form container openings in the container forming layer of the modified shapes; and forming capacitors comprising container shapes using the container openings in the container forming layer.
 40. The method of claim 39 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed.
 41. The method of claim 39 wherein the conditions comprise plasma etching using a total applied power of at least 10 W/cm² of substrate area being processed.
 42. The method of claim 39 wherein the conditions comprise plasma etching using a substrate temperature of at least 40° C.
 43. The method of claim 39 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, and using a substrate temperature of at least 40° C.
 44. The method of claim 39 wherein the conditions comprise a fluorocarbon comprising etching chemistry.
 45. The method of claim 39 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, using a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 46. The method of claim 39 wherein the conditions comprise plasma etching in a capacitively coupled, multi frequency plasma etcher.
 47. The method of claim 46 wherein multiple frequencies are applied to a wafer chuck upon which the substrate rests during etching.
 48. The method of claim 47 wherein the plasma etching uses a total applied power of at least 7 W/cm² of substrate area being processed to the wafer chuck, uses a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 49. The method of claim 46 wherein one frequency is applied to a wafer chuck upon which the substrate rests during etching and another frequency is applied to an electrode spaced from the substrate.
 50. A method of forming a capacitor, comprising: depositing a container forming layer over a substrate; depositing a carbon containing masking layer over the container forming layer; patterning the carbon containing masking layer to comprise a plurality of container openings therein having minimum feature dimensions of less than or equal to 0.20 micron, the respective container openings including no more than two straight line segments of at least 2 nanometers long; plasma etching the container forming layer through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings to include at least four straight line segments of at least 2 nanometers long, the at least four straight line segments having total added length which is more than 50% of the perimeter of the respective modified shapes, and b) form container openings in the container forming layer of the modified shapes; and forming capacitors comprising container shapes using the container openings in the container forming layer.
 51. The method of claim 50 wherein said total added length is more than 60% of the perimeter of the respective modified shapes.
 52. The method of claim 50 wherein said total added length is more than 70% of the perimeter of the respective modified shapes.
 53. The method of claim 50 wherein said total added length is more than 80% of the perimeter of the respective modified shapes.
 54. The method of claim 50 wherein said total added length is more than 90% of the perimeter of the respective modified shapes.
 55. The method of claim 50 wherein the modified shape has said straight line segments numbering only four.
 56. The method of claim 50 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed.
 57. The method of claim 50 wherein the conditions comprise plasma etching using a total applied power of at least 10 W/cm² of substrate area being processed.
 58. The method of claim 50 wherein the conditions comprise plasma etching using a substrate temperature of at least 40° C.
 59. The method of claim 50 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, and using a substrate chuck temperature of at least 40° C.
 60. The method of claim 50 wherein the conditions comprise a fluorocarbon comprising etching chemistry.
 61. The method of claim 50 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, using a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 62. The method of claim 50 wherein the conditions comprise plasma etching in a capacitively coupled, multi frequency plasma etcher.
 63. The method of claim 62 wherein multiple frequencies are applied to a wafer chuck upon which the substrate rests during etching.
 64. The method of claim 63 wherein the plasma etching uses a total applied power of at least 7 W/cm² of substrate area being processed to the wafer chuck, uses a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 65. The method of claim 62 wherein one frequency is applied to a wafer chuck upon which the substrate rests during etching and another frequency is applied to an electrode spaced from the substrate.
 66. A method of forming a capacitor, comprising: depositing a container forming layer over a substrate; depositing a carbon containing masking layer over the container forming layer; patterning the carbon containing masking layer to comprise a plurality of circular shaped container openings therein having minimum diameter of less than or equal to 0.20 micron; plasma etching the container forming layer through the masking layer openings using conditions effective to both a) etch the masking layer to modify shape of the masking layer openings from circular to having at least four straight line segments of at least 2 nanometers long, and b) form container openings in the container forming layer of the modified shapes; and forming capacitors comprising container shapes using the container openings in the container forming layer.
 67. The method of claim 66 wherein the plasma etching forms the modified shapes to be squares.
 68. The method of claim 66 wherein the plasma etching forms the modified shapes to be hexagons.
 69. The method of claim 66 wherein the patterning comprises photolithography and solvent etch.
 70. The method of claim 66 wherein the container openings are patterned to have minimum feature dimensions of less than 0.15 micron.
 71. The method of claim 66 comprising fabricating the capacitor as part of DRAM circuitry.
 72. The method of claim 66 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed.
 73. The method of claim 66 wherein the conditions comprise plasma etching using a total applied power of at least 10 W/cm² of substrate area being processed.
 74. The method of claim 66 wherein the conditions comprise plasma etching using a substrate temperature of at least 40° C.
 75. The method of claim 66 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, and using a substrate temperature of at least 40° C.
 76. The method of claim 66 wherein the conditions comprise a fluorocarbon comprising etching chemistry.
 77. The method of claim 66 wherein the conditions comprise plasma etching using a total applied power of at least 7 W/cm² of substrate area being processed, using a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 78. The method of claim 66 wherein the conditions comprise plasma etching in a capacitively coupled, multi frequency plasma etcher.
 79. The method of claim 78 wherein multiple frequencies are applied to a wafer chuck upon which the substrate rests during etching.
 80. The method of claim 79 wherein the plasma etching uses a total applied power of at least 7 W/cm² of substrate area being processed to the wafer chuck, uses a substrate temperature of at least 40° C., and a fluorocarbon comprising etching chemistry.
 81. The method of claim 78 wherein one frequency is applied to a wafer chuck upon which the substrate rests during etching and another frequency is applied to an electrode spaced from the substrate. 